Research Output | Dar Al-hikmah Library | IIUM Only
We consider cluster model of FeNi4 cluster (as material target) where Fe ion is surrounded by four Ni ions in order to understand the mechanisms involved in the reactive ion etching (RIE) processes on magnetic surfaces(e.g., FeNi surface). By considering CO ions as reactive gases, we etch Fe ion from the cluster surface providing ion pentacarbonyl,